• Help section

    Frequently asked questions

    We have compiled the most frequently asked questions and answers about our track-etched membranes for you here.
    • The technology used to produce the track-etched membranes consists of a two-stage process.

      First, the polymer film is ”shot“ or irradiated with heavy ions using an (ECR) ion source system. This allows precise control over the pore density (number of pores per unit area of the film (cm-2)). Each ion creates a predetermined breaking point in the polymer film, the so-called track. Cylindrical pores are then etched from this track.

      In the second step, the pores are formed by chemical etching in acid baths. The damaged tracks are more sensitive to chemicals than the surrounding bulk polymer. Depending on the duration in the acid bath, these tracks are converted into pores / hollow channels. Pore diameter and pore shape are determined by the etching conditions (chemicals, temperature & duration).

    • The gold-coated i3 TrackPor P / R membranes are stable in acidic and alkaline environments and are also insensitive to oxidizing substances.

      For the aluminum-coated polyester membranes i3 TrackPor PA / PAR, it is recommended to maintain a moderate pH value (pH 4 – 8) to ensure the stability of the coating in the liquid medium (depending on the temperature, pressure and filtration time).

    • Yes. A defined process increases the hydrophilicity of the i3 TrackPor membranes and therefore also their wettability by aqueous or polar solutions. Hydrophobic membranes, on the other hand, are very difficult to wet with aqueous solutions.

    • No. We do not carry out the sampling on site or the analysis in the laboratory ourselves.
      If required, we can recommend an accredited laboratory in your area.

    Close-up of several gold-coated membranes in the punching machine with tweezers detaching a membrane
    Image composition consisting of two i3 TrackPor M air monitor cassettes and the membranes i3 TrackPor, i3 TrackPor R and i3 TrackPor PAR

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